Plasma Etching Processes for Interconnect Realization in VLSI

Written By Nicolas Posseme
Plasma Etching Processes for Interconnect Realization in VLSI
  • Publsiher : Elsevier
  • Release : 14 April 2015
  • ISBN : 0081005903
  • Pages : 128 pages
  • Rating : /5 from reviews
GET THIS BOOKPlasma Etching Processes for Interconnect Realization in VLSI


Download or read book entitled Plasma Etching Processes for Interconnect Realization in VLSI by author: Nicolas Posseme which was release on 14 April 2015 and published by Elsevier with total page 128 pages . This book available in PDF, EPUB and Kindle Format. This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits Focused on plasma-dielectric surface interaction Helps you further reduce the dielectric constant for the future technological nodes

Plasma Etching Processes for Interconnect Realization in VLSI

Plasma Etching Processes for Interconnect Realization in VLSI
  • Author : Nicolas Posseme
  • Publisher : Elsevier
  • Release Date : 2015-04-14
  • Total pages : 128
  • ISBN : 0081005903
GET BOOK

Summary : This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. This book focuses on back end of line (BEOL) ...

Low Energy Electrons

Low Energy Electrons
  • Author : Oddur Ingólfsson
  • Publisher : CRC Press
  • Release Date : 2019-04-23
  • Total pages : 418
  • ISBN : 0081005903
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Summary : Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma ...

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  • ISBN : 0081005903
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  • ISBN : 0081005903
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Summary : Advances in Atomic, Molecular, and Optical Physics, Volume 66, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth as new experimental and theoretical techniques are used on many problems, both old and new. Topics covered include related applied areas, such as atmospheric ...

Plasma Etching Processes for CMOS Devices Realization

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  • Author : Nicolas Posseme
  • Publisher : Elsevier
  • Release Date : 2017-01-25
  • Total pages : 136
  • ISBN : 0081005903
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Summary : Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, ...

Fabrication of Two dimensional and Three dimensional Photonic Crystal Devices for Applications in Chip scale Optical Interconnects

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  • Author : Anonim
  • Publisher : Unknown
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  • ISBN : 0081005903
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Summary : To date, the realization of chip-scale optical interconnects has been inhibited by the lack of a device technology that can provide optical functionality at a scale commensurate with integrated circuits. To overcome this limitation, I propose the realization of an "optical superhighway" as an alternative interconnect paradigm for next-generation integrated ...

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  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1989
  • Total pages : 508
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Summary : Read online Proceedings International IEEE VLSI Multilevel Interconnection Conference written by , published by which was released on 1989. Download full Proceedings International IEEE VLSI Multilevel Interconnection Conference Books now! Available in PDF, ePub and Kindle....

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Summary : Read online 1986 Proceedings written by , published by which was released on 1986. Download full 1986 Proceedings Books now! Available in PDF, ePub and Kindle....

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Summary : Read online Proceedings written by , published by which was released on 1996. Download full Proceedings Books now! Available in PDF, ePub and Kindle....

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Summary : Read online Extended Abstracts written by Electrochemical Society, published by which was released on 1992. Download full Extended Abstracts Books now! Available in PDF, ePub and Kindle....

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Summary : VLSI Electronics...

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Summary : Read online 1995 Symposium on VLSI Technology written by IEEE Electron Devices Society, published by IEEE which was released on 1995. Download full 1995 Symposium on VLSI Technology Books now! Available in PDF, ePub and Kindle....

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  • ISBN : 0081005903
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Summary : Read online Eighth International IEEE VLSI Multilevel Interconnection Conference 1991 written by IEEE Electron Devices Society, published by Institute of Electrical & Electronics Engineers(IEEE) which was released on 1991-06. Download full Eighth International IEEE VLSI Multilevel Interconnection Conference 1991 Books now! Available in PDF, ePub and Kindle....

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Summary : Read online 1987 Proceedings written by , published by which was released on 1987. Download full 1987 Proceedings Books now! Available in PDF, ePub and Kindle....

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Summary : Read online Dissertation Abstracts International written by , published by which was released on 2006. Download full Dissertation Abstracts International Books now! Available in PDF, ePub and Kindle....