Materials and Processes for Next Generation Lithography

Written By Alex Robinson
Materials and Processes for Next Generation Lithography
  • Publsiher : Elsevier
  • Release : 01 September 2016
  • ISBN : 9780081003541
  • Pages : 500 pages
  • Rating : /5 from reviews
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Download or read book entitled Materials and Processes for Next Generation Lithography by author: Alex Robinson which was release on 01 September 2016 and published by Elsevier with total page 500 pages . This book available in PDF, EPUB and Kindle Format. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place"

Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography
  • Author : Alex Robinson
  • Publisher : Elsevier
  • Release Date : 2016-09-01
  • Total pages : 500
  • ISBN : 9780081003541
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Summary : These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional ...

Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography
  • Author : Anonim
  • Publisher : Elsevier
  • Release Date : 2016-11-08
  • Total pages : 634
  • ISBN : 9780081003541
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Summary : As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography ...

Nanoimprint Lithography

Nanoimprint Lithography
  • Author : Hongbo Lan,Yucheng Ding,Hongzhong Liu
  • Publisher : Nova Science Pub Incorporated
  • Release Date : 2011
  • Total pages : 73
  • ISBN : 9780081003541
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Summary : Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the ...

Photomask and Next generation Lithography Mask Technology XI

Photomask and Next generation Lithography Mask Technology XI
  • Author : Hiroyoshi Tanabe,Society of Photo-Optical Instrumentation Engineers
  • Publisher : SPIE-International Society for Optical Engineering
  • Release Date : 2004
  • Total pages : 990
  • ISBN : 9780081003541
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Summary : Read online Photomask and Next generation Lithography Mask Technology XI written by Hiroyoshi Tanabe,Society of Photo-Optical Instrumentation Engineers, published by SPIE-International Society for Optical Engineering which was released on 2004. Download full Photomask and Next generation Lithography Mask Technology XI Books now! Available in PDF, ePub and Kindle....

Photomask and Next generation Lithography Mask Technology

Photomask and Next generation Lithography Mask Technology
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2004
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online Photomask and Next generation Lithography Mask Technology written by , published by which was released on 2004. Download full Photomask and Next generation Lithography Mask Technology Books now! Available in PDF, ePub and Kindle....

Annual Review of Materials Research

Annual Review of Materials Research
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2009
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online Annual Review of Materials Research written by , published by which was released on 2009. Download full Annual Review of Materials Research Books now! Available in PDF, ePub and Kindle....

Materials and Processes for Advanced Lithography Applications

Materials and Processes for Advanced Lithography Applications
  • Author : Wei-Lun Kane Jen
  • Publisher : Unknown
  • Release Date : 2009
  • Total pages : 354
  • ISBN : 9780081003541
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Summary : Step and Flash Imprint Lithography (S-FIL) is a high resolution, next-generation lithography technique that uses an ambient temperature and low pressure process to replicate high resolution images in a UV-curable liquid material. Application of the S-FIL process in conjunction with multi-level imprint templates and new imprint materials enables one S-FIL ...

Solvent based Development of Photoresists for Next generation Lithography

Solvent based Development of Photoresists for Next generation Lithography
  • Author : Christine Y. Ouyang
  • Publisher : Unknown
  • Release Date : 2013
  • Total pages : 334
  • ISBN : 9780081003541
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Summary : As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base development has been the industry standard for over twenty years, there are still several issues that need to be overcome. First, the high surface tension of aqueous ...

Mechanical Engineering

Mechanical Engineering
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2005
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online Mechanical Engineering written by , published by which was released on 2005. Download full Mechanical Engineering Books now! Available in PDF, ePub and Kindle....

JJAP

JJAP
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2006
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online JJAP written by , published by which was released on 2006. Download full JJAP Books now! Available in PDF, ePub and Kindle....

Small Molecule Photoresist Materials for Next Generation Lithography

Small Molecule Photoresist Materials for Next Generation Lithography
  • Author : Marie Elyse Krysak
  • Publisher : Unknown
  • Release Date : 2013
  • Total pages : 414
  • ISBN : 9780081003541
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Summary : Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit will double every four years. In order to successfully continue this trend of miniaturizing feature sizes, new, smaller sized patterning materials must be studied. Small molecule photoresists are being ...

Semiconductor International

Semiconductor International
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2008
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online Semiconductor International written by , published by which was released on 2008. Download full Semiconductor International Books now! Available in PDF, ePub and Kindle....

Magnetic Materials Processes and Devices VI

Magnetic Materials  Processes  and Devices VI
  • Author : Electrochemical Society. Electrodeposition Division,Electrochemical Society. Meeting
  • Publisher : The Electrochemical Society
  • Release Date : 2001
  • Total pages : 618
  • ISBN : 9780081003541
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Summary : Read online Magnetic Materials Processes and Devices VI written by Electrochemical Society. Electrodeposition Division,Electrochemical Society. Meeting, published by The Electrochemical Society which was released on 2001. Download full Magnetic Materials Processes and Devices VI Books now! Available in PDF, ePub and Kindle....

Journal of Scientific Industrial Research

Journal of Scientific   Industrial Research
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2002
  • Total pages : 212
  • ISBN : 9780081003541
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Summary : Read online Journal of Scientific Industrial Research written by , published by which was released on 2002. Download full Journal of Scientific Industrial Research Books now! Available in PDF, ePub and Kindle....

Organic Inorganic Photoresist and Laser Induced Heating Process for Next Generation Lithography

Organic Inorganic Photoresist and Laser Induced Heating Process for Next Generation Lithography
  • Author : Jing Jiang
  • Publisher : Unknown
  • Release Date : 2015
  • Total pages : 344
  • ISBN : 9780081003541
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Summary : What technology will enable lithography to continue Moore's law beyond 10 nm node? Traditional photolithography, using a 193 nm wavelength and chemically amplified resist (CAR), is currently the workhorse in the semiconductor industry, but faces challenge of achieving required resolution and line width roughness (LWR). Extreme Ultraviolet Lithography (EUVL), using 13.5 nm light, ...