Advances in CMP polishing Technologies for the Manufacture of Electronic Devices

Written By Toshiro Doi
Advances in CMP polishing Technologies for the Manufacture of Electronic Devices
  • Publsiher : William Andrew
  • Release : 01 December 2011
  • ISBN : 1437778593
  • Pages : 317 pages
  • Rating : /5 from reviews
GET THIS BOOKAdvances in CMP polishing Technologies for the Manufacture of Electronic Devices


Download or read book entitled Advances in CMP polishing Technologies for the Manufacture of Electronic Devices by author: Toshiro Doi which was release on 01 December 2011 and published by William Andrew with total page 317 pages . This book available in PDF, EPUB and Kindle Format. CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2011-12
  • Total pages : 317
  • ISBN : 1437778593
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Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering ...

Advances in Cmp Polishing Technologies

Advances in Cmp Polishing Technologies
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2017-11-13
  • Total pages : 500
  • ISBN : 1437778593
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Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field making cutting-edge R&D accessible to the wider engineering community. ...

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP
  • Author : Suryadevara Babu
  • Publisher : Woodhead Publishing
  • Release Date : 2016-01-09
  • Total pages : 536
  • ISBN : 1437778593
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Summary : Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers ...

Advances in Chemical Mechanical Polishing

Advances in Chemical Mechanical Polishing
  • Author : Duane S. Boning,Johann W. Bartha,Ara Philipossian,Greg Shinn,Ingrid Vos
  • Publisher : Cambridge University Press
  • Release Date : 2014-06-05
  • Total pages : 310
  • ISBN : 1437778593
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Summary : While now in widespread use in integrated circuit fabrication, chemical-mechanical polishing (CMP) is also starting to appear in a surprisingly wide range of applications, with a growing variety of processes and technologies. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of CMP. CMP of both ...

Advances in Chemical Mechanical Polishing Volume 816

Advances in Chemical Mechanical Polishing  Volume 816
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-09
  • Total pages : 292
  • ISBN : 1437778593
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Summary : While now in widespread use in integrated circuit fabrication, chemical-mechanical polishing (CMP) is also starting to appear in a surprisingly wide range of applications, with a growing variety of processes and technologies. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of CMP. CMP of both ...

Advances in Materials Manufacturing Science and Technology II

Advances in Materials Manufacturing Science and Technology II
  • Author : Chengyu Jiang
  • Publisher : Trans Tech Publication
  • Release Date : 2006
  • Total pages : 1190
  • ISBN : 1437778593
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Summary : The present volume contains 293 selected and peer-reviewed papers, carefully chosen from among the more than 500 papers presented, by worldwide specialists from industry and academia, at the 12th International Manufacturing Conference in China; organized by the Northwestern Polytechnic University....

Chemical Mechanical Polishing 2001 Advances and Future Challenges Volume 671

Chemical Mechanical Polishing 2001   Advances and Future Challenges  Volume 671
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2001-12-14
  • Total pages : 308
  • ISBN : 1437778593
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2001....

Advances in Materials Manufacturing Science and Technology

Advances in Materials Manufacturing Science and Technology
  • Author : Xing Ai,Jian Feng Li,Chuanzhen Huang
  • Publisher : Trans Tech Publications Ltd
  • Release Date : 2004-12-15
  • Total pages : 930
  • ISBN : 1437778593
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Summary : This collection comprises a selection of over 180 papers; submitted to the editors by numerous universities and industrial concerns, and subjected to peer-review by at least two expert referees. Volume is indexed by Thomson Reuters CPCI-S (WoS). The papers were selected on the basis of their quality, and their combined coverage ...

Chemical mechanical Polishing

Chemical mechanical Polishing
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1999
  • Total pages : 212
  • ISBN : 1437778593
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Summary : Read online Chemical mechanical Polishing written by , published by which was released on 1999. Download full Chemical mechanical Polishing Books now! Available in PDF, ePub and Kindle....

Chemical Mechanical Polishing Fundamentals and Challenges Volume 566

Chemical Mechanical Polishing   Fundamentals and Challenges  Volume 566
  • Author : S. V. Babu,S. Danyluk,M. Krishnan,M. Tsujimura
  • Publisher : Materials Research Society
  • Release Date : 2000-02-10
  • Total pages : 281
  • ISBN : 1437778593
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners....

Amorphous and Nanocrystalline Silicon Science and Technology

Amorphous and Nanocrystalline Silicon Science and Technology
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2004
  • Total pages : 212
  • ISBN : 1437778593
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Summary : Read online Amorphous and Nanocrystalline Silicon Science and Technology written by , published by which was released on 2004. Download full Amorphous and Nanocrystalline Silicon Science and Technology Books now! Available in PDF, ePub and Kindle....

Flexible Electronics 2004 Materials and Device Technology Volume 814

Flexible Electronics 2004   Materials and Device Technology  Volume 814
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-09
  • Total pages : 402
  • ISBN : 1437778593
GET BOOK

Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners....

Chemical Mechanical Polishing 2001 Advances and Future Challenges

Chemical Mechanical Polishing 2001   Advances and Future Challenges
  • Author : Suryadevara V. Babu,Kenneth C. Cadien,Hiroyuki Yano
  • Publisher : Cambridge University Press
  • Release Date : 2014-06-05
  • Total pages : 306
  • ISBN : 1437778593
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Summary : With copper and barrier-layer integration firmly in place, several other exciting developments are occurring in the practice of chemical-mechanical polishing (CMP), and many advances are described in this book, first published in 2001. Discussions on CMP for shallow-trench isolation, abrasive-free slurries, improvements in pad and tool configurations including fixed abrasive pads, ...

Progress in Compound Semiconductor Materials electronic and Optoelectronic Applications

Progress in Compound Semiconductor Materials      electronic and Optoelectronic Applications
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2005
  • Total pages : 212
  • ISBN : 1437778593
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Summary : Read online Progress in Compound Semiconductor Materials electronic and Optoelectronic Applications written by , published by which was released on 2005. Download full Progress in Compound Semiconductor Materials electronic and Optoelectronic Applications Books now! Available in PDF, ePub and Kindle....

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization
  • Author : Robin Veronica Ihnfeldt
  • Publisher : Unknown
  • Release Date : 2005
  • Total pages : 250
  • ISBN : 1437778593
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Summary : Read online Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization written by Robin Veronica Ihnfeldt, published by which was released on 2005. Download full Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization Books now! Available in PDF, ePub and Kindle....