Advances in Chemical Mechanical Planarization CMP

Written By Suryadevara Babu
Advances in Chemical Mechanical Planarization  CMP
  • Publsiher : Woodhead Publishing
  • Release : 09 January 2016
  • ISBN : 0081002181
  • Pages : 536 pages
  • Rating : 4/5 from 1 reviews
GET THIS BOOKAdvances in Chemical Mechanical Planarization CMP


Download or read book entitled Advances in Chemical Mechanical Planarization CMP by author: Suryadevara Babu which was release on 09 January 2016 and published by Woodhead Publishing with total page 536 pages . This book available in PDF, EPUB and Kindle Format. Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. Considers techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for particular materials Addresses consumables and process control for improved CMP

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP
  • Author : Suryadevara Babu
  • Publisher : Woodhead Publishing
  • Release Date : 2016-01-09
  • Total pages : 536
  • ISBN : 0081002181
GET BOOK

Summary : Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers ...

Advances in Chemical mechanical Planarization

Advances in Chemical mechanical Planarization
  • Author : Rajiv K. Singh,Rajeev Bajaj,Materials Research Society
  • Publisher : Unknown
  • Release Date : 2002
  • Total pages : 41
  • ISBN : 0081002181
GET BOOK

Summary : Read online Advances in Chemical mechanical Planarization written by Rajiv K. Singh,Rajeev Bajaj,Materials Research Society, published by which was released on 2002. Download full Advances in Chemical mechanical Planarization Books now! Available in PDF, ePub and Kindle....

Advances in Chemical Mechanical Planarization Cmp

Advances in Chemical Mechanical Planarization  Cmp
  • Author : Suryadevara Babu
  • Publisher : Woodhead Publishing Limited
  • Release Date : 2016-01-12
  • Total pages : 810
  • ISBN : 0081002181
GET BOOK

Summary : Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers ...

Advances in Chemical mechanical Polishing

Advances in Chemical mechanical Polishing
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2004
  • Total pages : 212
  • ISBN : 0081002181
GET BOOK

Summary : Read online Advances in Chemical mechanical Polishing written by , published by which was released on 2004. Download full Advances in Chemical mechanical Polishing Books now! Available in PDF, ePub and Kindle....

Advances and Challenges in Chemical Mechanical Planarization

Advances and Challenges in Chemical Mechanical Planarization
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2007
  • Total pages : 371
  • ISBN : 0081002181
GET BOOK

Summary : Read online Advances and Challenges in Chemical Mechanical Planarization written by , published by which was released on 2007. Download full Advances and Challenges in Chemical Mechanical Planarization Books now! Available in PDF, ePub and Kindle....

Advances in Chemical Mechanical Polishing Volume 816

Advances in Chemical Mechanical Polishing  Volume 816
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-09
  • Total pages : 292
  • ISBN : 0081002181
GET BOOK

Summary : While now in widespread use in integrated circuit fabrication, chemical-mechanical polishing (CMP) is also starting to appear in a surprisingly wide range of applications, with a growing variety of processes and technologies. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of CMP. CMP of both ...

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2011-12
  • Total pages : 317
  • ISBN : 0081002181
GET BOOK

Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering ...

Advances and Challenges in Chemical Mechanical Planarization

Advances and Challenges in Chemical Mechanical Planarization
  • Author : Gerfried Zwicker,Christopher Borst,Laertis Economikos,Ara Philipossian
  • Publisher : Cambridge University Press
  • Release Date : 2014-06-05
  • Total pages : 388
  • ISBN : 0081002181
GET BOOK

Summary : Chemical mechanical planarization (CMP) has been a leading-edge technology in semiconductor processing for the past 15−20 years. A successful CMP process is based in fundamental science across the disciplines of mechanical engineering, chemical engineering, colloid science, materials science and chemistry. Traditionally, the MRS Spring Meeting serves as a nexus for multidisciplinary ...

Advances in Chemical Mechanical Polishing

Advances in Chemical Mechanical Polishing
  • Author : Duane S. Boning,Johann W. Bartha,Ara Philipossian,Greg Shinn,Ingrid Vos
  • Publisher : Cambridge University Press
  • Release Date : 2014-06-05
  • Total pages : 310
  • ISBN : 0081002181
GET BOOK

Summary : While now in widespread use in integrated circuit fabrication, chemical-mechanical polishing (CMP) is also starting to appear in a surprisingly wide range of applications, with a growing variety of processes and technologies. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of CMP. CMP of both ...

Chemical Mechanical Planarization Volume 767

Chemical Mechanical Planarization  Volume 767
  • Author : Duane S. Boning,Katia Devriendt,Michael R. Oliver,David J. Stein,Ingrid Vos
  • Publisher : Mrs Proceedings
  • Release Date : 2003-08-27
  • Total pages : 348
  • ISBN : 0081002181
GET BOOK

Summary : Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have diversified and we have begun to understand aspects of the physics and chemistry of the process, a new generation of CMP innovations is unfolding. New slurries and consumables are ...

Chemical Mechanical Polishing 2001 Advances and Future Challenges Volume 671

Chemical Mechanical Polishing 2001   Advances and Future Challenges  Volume 671
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2001-12-14
  • Total pages : 308
  • ISBN : 0081002181
GET BOOK

Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2001....

Chemical Mechanical Planarization Volume 867

Chemical Mechanical Planarization  Volume 867
  • Author : Materials Research Society. Meeting
  • Publisher : Cambridge University Press
  • Release Date : 2005-07-19
  • Total pages : 302
  • ISBN : 0081002181
GET BOOK

Summary : Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum ...

Chemical Mechanical Polishing 2001 Advances and Future Challenges

Chemical Mechanical Polishing 2001   Advances and Future Challenges
  • Author : Suryadevara V. Babu,Kenneth C. Cadien,Hiroyuki Yano
  • Publisher : Cambridge University Press
  • Release Date : 2014-06-05
  • Total pages : 306
  • ISBN : 0081002181
GET BOOK

Summary : With copper and barrier-layer integration firmly in place, several other exciting developments are occurring in the practice of chemical-mechanical polishing (CMP), and many advances are described in this book, first published in 2001. Discussions on CMP for shallow-trench isolation, abrasive-free slurries, improvements in pad and tool configurations including fixed abrasive pads, ...

Advances in CMP Polishing Technologies

Advances in CMP Polishing Technologies
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2011-11-30
  • Total pages : 328
  • ISBN : 0081002181
GET BOOK

Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field – making cutting-edge R&D accessible to the wider engineering community. ...

Emerging Contaminants

Emerging Contaminants
  • Author : Aurel Nuro
  • Publisher : BoD – Books on Demand
  • Release Date : 2021-05-27
  • Total pages : 332
  • ISBN : 0081002181
GET BOOK

Summary : Emerging Contaminants presents the reader with information on classification, recent studies, and adverse effects on the environment and human health of the main classes of contaminants. Emerging contaminants are synthetic or natural compounds and microorganisms produced and used by humans that cause adverse ecological and human health effects when they ...